e beam lithography

Brand Name:CNOEC, OPTO-EDU

Model Number:A63.7010

Place of Origin:China

...ElectronDetector and In-Lens Electron Detector Image Resolution ≤1nm@15kV; ≤1.5nm@1kV Beam Current Densit >5300 A/cm2 Minimum Beam Spot Size ≤2 nm Lithography Specitications Electron Beam Shutter Rise Time < 100 ns Writing Field ≤500x500 um Minimum

Brand Name:STD Filter

Model Number:STD NWM-008

Place of Origin:Hebei,China

... lithography is a key technology for low-cost and large-scale production of nanostructures.Silicon or quartz templates produced by either electron beams or DUV lithography and reaction ion etching are currently used.However, they are very expensive and

Brand Name:KYKY

Model Number:EM6910

Place of Origin:China

...years SEM manufacture experience, the whole EM series supports old system refurbished and customized system as SEM+, such as Electron Beam Lithography remodel, LaB6 upgrade,integrated with STM,AFM,Heating Stage;Cryo Stage;Tensile Stage;Micro-nano ...

Place of Origin:China

Brand Name:BD

... thin film pressure sensor adopts the advanced ion-sputtering thin film and ion beam lithography technology. Now this sensor is widely used in the pressuring measuring of the new model and huge thrust low temperature motor. It has ...