astm zirconium sputtering targets

Brand Name:JINXING

Model Number:Zirconium Sputtering Target

Place of Origin:China

Zirconium Sputtering Target Zirconium sputtering target for PVD coating systerm, coating target, multi-arc target, sputtering target, vacuum coating target. Description Zirconium Sputtering Target, Zirconium Target are available in varying sizes Grades: R60702, 99.2%min Purity: 99.5% Purity: 99.95% Hf<300ppm or Hf<4.5%) Shape: Round Shape , Tube Shape and Plate Shape. Sizes: Plate sputtering targets...

Brand Name:PRM

Model Number:Custom

Place of Origin:China

...WT 0.5-4.5mm,L <10meters Or process according to customer's request. Standard: ASTM B523 ASTM B658,ASTM B353 Main process: Preparation of consumable electrodes, casting, forging, hot extrusion (tube blank), cold working and finishing. ...

Brand Name:APG

Place of Origin:china

Zirconium targets are sputtering targets processed from high-purity zirconium (Zr) metal. They feature low hydrogen absorption, a high melting point (1855℃), excellent corrosion resistance, and good thermal conductivity. They are widely used in semiconductors, optical coatings, and functional coatings. Due to zirconium...

Brand Name:Forged

Place of Origin:Luoyang

Model Number:customized

...zirconium sputtering target coating materials customization Zirconium Description Zirconium and zirconium alloys have low density, high specific strength, corrosion resistance, radiation resistance, excellent wear resistance, excellent processing performance, non-toxic,non-magnetic, compared with traditional stainless steel, copper, nickel, titanium and other metal alloys, zirconium and zirconium...

Brand Name:CSTI

Model Number:20221010

Place of Origin:China

...Sputtering Target Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum PVD Coating evaporation Metal sputtering targets are used in physical vapor deposition (PVD) processes to coat materials with a thin layer of metal. Common metals used for sputtering targets include titanium, aluminum, chrome, zirconium...

Brand Name:LHTI

Model Number:LH-10

Place of Origin:China

...Sputtering Targets for PVD Vacuum Coating Machine ​ High purity titanium sputtering targets Product name Titanium Sputtering Targets for pvd coating machine Grade Titanium (Gr1, Gr2, Gr5, Gr7,GR12) Alloy target: Ti-Al, Ti-Cr, Ti-Zr etc Other materials:chrome,zirconium,copper ,tungsten etc. Origin Baoji city, Shaanxi Province,hina Titanium content ≥99.5 (%) Impurity content <0.04(%) Density 4.51 or 4.50 g/cm3 Standard ASTM

Categories:Molybdenum Products

Country/Region:china

... Sputtering Target Molybdenum Sputtering Target 10.2g/Cm3 Molybdenum Plate 10.2g/Cm3 Send Email Inquiry Now Molybdenum Sputtering Target Description In the electronics industry molybdenum sputtering targets are mainly used for flat panel displays,

Brand Name:Feiteng

Model Number:Titanium tube target

Place of Origin:Baoji, Shaanxi, China

...Target ASTM B861-06 a 133OD*125ID*2940L Include Flange Titanium Gr2 Name Titanium tube target Standard ASTM B861 Transport Package Vacuum package in wooden case Origin Baoji, Shaanxi, China Port of deliver Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port Size φ133*φ125*2940(include flange ) Tube target is a sputtering source which can form various functional films on the substrate by magnetron sputtering...

Brand Name:Sanhui

Model Number:Mo1

Place of Origin:Henan, China

...Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling The molybdenum sputtering target has the characteristics of high purity, high density and fine grain, so that the sputtering efficiency, uniform film thickness and smooth etching surface are obtained in sputtering. There are two kinds of molybdenum sputtering

Brand Name:ZCQ

Model Number:ZCQ

Place of Origin:China

High temperature resistant high quality fused silica sputtering target Silicon dioxide sputtering target contains Si and O. Silicon dioxide (SiO2), also known as Silica, is a natural compound made from two of the most abundant materials on the planet: ...

Categories:Sputtering Target

Country/Region:china

...ough precision processing, featuring excellent film uniformity, density, and sputtering stability. It is suitable for various coating processes, such as magnetron sputtering and ion beam sputtering. Application Areas 1.Semiconductor Memory Chips: Used for

Brand Name:ZG

Model Number:MS

Place of Origin:CHINA

... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for Pulsed Laser Deposition ( PLD ) systems and

Brand Name:ZHENAN

Model Number:Pure Tungsten Metal Sputtering Target

Place of Origin:China

...fields because of its excellent physical and chemical properties. Sputtering targets are used for magnetron sputtering coating, which is a new type of physical vapor coating (PVD) method. An orthogonal magnetic field and an electric field are added between

Brand Name:TOBO

Model Number:NI 200

Place of Origin:China

... annealed surface Material Ni 98% Grade inconel 600 625 incoloy800 N04400 N08020 N08367 Standards AISI ASTM UNS Certifications ISO 6208 Packing Industry standard packaging or

Brand Name:TORICH

Model Number:304L

Place of Origin:China

Torich 133*4*4113mm 304L Planar Sputtering Target Sputtering Target Stainless Steel Tube Torich 133*4*4113mm 304L Sputtering Target Stainless Steel Tube Grade:304L Specification: 133*4*4113mm Tolerance of OD:0.1-0.4mm Tolerance of ID:124.5-125.2mm ...

Brand Name:PRM

Model Number:custom

Place of Origin:China

Molybdenum Copper Alloy Magnetron Sputtering Target 1. Description of Molybdenum Copper Alloy Magnetron Sputtering Target: The preparation of molybdenum-copper alloy magnetron sputtering targets is mainly by infiltration method. First, molybdenum powder...

Brand Name:GNEE

Model Number:TiP0001

Place of Origin:Henan

Pure Titanium 99.99% 4n Disc High Purity Ti Metal Sputtering Target Titanium is metallic and ductile. Sound travels at a rate of 5,090 m/s. The main characteristics of titanium are low density, high mechanical strength and ...

Brand Name:JB

Place of Origin:Guangdong, China

Product Description Specification item value Place of Origin China Brand Name JB FAQ 1. who are we? We are based in Guangdong, China, start from 2022,sell to Domestic Market(50.00%),South Asia(50.00%),Southern Europe(50.00%),Northern Europe(50.00%),Central...