ISO9001 Vacuum Coating Sputtering Target Materials High Strength
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Titanium Tube Target Titanium Gr2 ASTM B861-06 a 133OD*125ID*2140L Vacuum Coating Target Item name Titanium tube target Size φ133*φ125*2140 Grade Gr2 Packaging Wooden case Port of place Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port......
Baoji Feiteng Metal Materials Co., Ltd.
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Tb Terbium Sputtering Target Rare Earth Metal Sputtering Targets
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...targets are made with high-purity terbium (Tb) as the main component and are important rare-earth metal sputtering targets. With high magnetostrictive properties, excellent thermal stability, and chemical stability, terbium targets are widely used in magnetic films, optical coatings, semiconductor functional films, nuclear energy, and research material fields. Prepared using advanced processes such as vacuum melting......
Shenzhen APG Material Company Limited
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99.8% Ti70Al30 Sputtering Targets Vacuum Melting Technics
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...Sputtering Targets JX offers a wide range of Ti Al Sputtering Targets for decorative and/or wear resistance coatings to provide black, gold, silver, red and rainbow color simulation on items such as cell phone, watch, glasses, bath parts and hardware, artwork, etc. Ti, Cr, Zr, TiAl, Ni, Cu, Stainless Steel, etc. Cr and TiAl targets......
JINXING MATECH CO LTD
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Titanium Sputtering Target Ti For Plating Ti Ti-Al Zr Cr for PVD coating
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...Sputtering Targets are high-purity titanium materials used in physical vapor deposition (PVD) and magnetron sputtering processes. Titanium is a lustrous, silvery-white metal known for its high strength-to-weight ratio, low density (4.5 g/cm³), and excellent corrosion resistance. It has a melting point of 1660°C and a vapour pressure of 10⁻⁴ Torr at 1,453°C, making it ideal for high-temperature and high-vacuum......
Baoji City Changsheng Titanium Co.,Ltd
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Vacuum Melting Electronic Grade Copper SiC Graphite Crucible for Semiconductor Target Material
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Vacuum Melting Electronic Grade Copper SiC Graphite Crucible Ultra-high purity crucible for vacuum melting of 6N (99.9999%) electronic grade copper used in semiconductor sputtering targets. Minimal outgassing and zero contamination design.Key Features Vacuum compatible ultra-low outgassing 6N purity retention capability Semiconductor grade material quality Clean melting for target......
Qingdao Baidun Special Ceramics Technology Co., Ltd.
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3N5 99.95% Molybdenum Sputtering Target For Vacuum Coating
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... There are two kinds of molybdenum sputtering targets:molybdenum planar target and molybdenum rotary target. Molybdenum sputtering target is one kind of industrial material, which is widely used in conductive glass, STN / TN / TFT-LCD, optical glass,...
Zhengzhou Sanhui Refractory Metal Co., Ltd.
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Metal Sputtering Targets Gr1 Gr2 Gr5 Titanium Sputtering Silver Sputtering Target For PVD Vacuum Coating Machine
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.../32/35/40/42/45/50(T) Or as customers' requests Surface: bright surface Application: Coating industry, sputtering vacuum coating industry Chemical Requirements: N C H Fe O Al V...
Baoji Lihua Nonferrous Metals Co., Ltd.
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Samarium Sputtering Target for High-Reflectivity Metal Films & Transparent Conductive Coatings
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...sputtering target is a high-purity rare earth metal functional material widely used in transparent conductive films, high-reflectivity metal films, semiconductor films, and special functional coatings. The product is made from high-purity samarium metal through precision melting, forming, and processing. It features a high melting......
Shanghai Sheeny Metal Mateirals Co.,Ltd.
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Molybdenum Disc Factory Moly Disc Vacuum Coating Molybdenum Sputtering Target High Temperature Resistance
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... to corrosion. Molybdenum is widely used in sputtering applications. Shape and Structure: Molybdenum Sputtering Targets are typically disc-shaped or rectangular in form. They have a flat and uniform surface, ensuring consistent sputtering performance. The...
Luoyang Hypersolid Metal Tech Co., Ltd
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Vacuum Packaging 99.95% Tungsten Products Sputtering Target Vacuum Coating
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...Sputtering Target Description: Tungsten sputtering target is a product made of pure tungsten powder as raw material. It has a silvery white appearance and is popular in many fields because of its excellent physical and chemical properties. Specifications: Material Type Tungsten Symbol W Atomic Weight 183.84 Atomic Number 74 Color/Appearance Grayish White, Lustrous, Metallic Thermal Conductivity 174 W/m.K Melting......
Zhenan Metallurgy Co., Ltd
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