Metallic Pure Polished Molybdenum Sputtering Targets
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...Molybdenum Round Target Description Pure Molybdenum Round Target, also known as molybdenum sputtering target, can be divided into two types, that is, molybdenum planar target and molybdenum rotary target. Features of Molybdenum Round Target 1. Thin-film deposited from molybdenum sputtering target is high in density and adhesion; 2. Molybdenum......
JINXING MATECH CO LTD
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10.2g/Cm3 Pure Molybdenum Rectangular/Round Plate Sputtering Target For Coating
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...Molybdenum Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling The molybdenum sputtering target has the characteristics of high purity, high density and fine grain, so that the sputtering efficiency, uniform film thickness and smooth etching surface are obtained in sputtering. There are two kinds of molybdenum sputtering...
Zhengzhou Sanhui Refractory Metal Co., Ltd.
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Round Molybdenum Products Molybdenum Sputtering Target For Vacuum Sputtering Coating Molybdenum Target Molybdenum Disc
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... from molybdenum powder. In most cases, it is made from the anode itself, which is sintered molybdenum powder, and the target is formed by the anode. Anodes can be stationary or rotating anodes. Other standard methods, chemical vapor deposition, or again,...
Shaanxi Peakrise Metal Co.,Ltd
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Bright Rotatable Molybdenum Sputtering Target 99.5%
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Molybdenum Rotatable Sputtering Target Material: Molybdenum Shape: Plate Purity: 99.5% Density: 10.2g/cm Color: Silver Standard: ASTM B386 Size: Cusomized Surface: Bright High Light: 99.95% Molybdenum Sputtering Target Molybdenum Sputtering Target 10.2g/Cm3 Molybdenum Plate 10.2g/Cm3 Molybdenum Sputtering Target Description In the electronics industry molybdenum sputtering targets......
Luoyang Hypersolid Metal Tech Co., Ltd
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Mo Metal Sputtering Target Molybdenum Sputtering Target
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Molybdenum targets, a rising star in high-performance materials With the continuous advancement of material science, molybdenum targets have emerged as a key driver in various fields. Molybdenum targets are critical across the semiconductor, display, photovoltaic, and high-end manufacturing sectors, delivering unique performance advantages that drive industrial innovation. Excellent Properties of Molybdenum Targets l Ultra-high Purity Molybdenum...
Shenzhen APG Material Company Limited
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99.6% Purity GR1 GR2 Round Titanium Sputtering Target Hardware
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...target" in "titanium sputtering target" comes from the common target materials in our daily life. In the sputtering deposition process, the coating material is bombarded by the electron beam or ion beam, just like the target is hit, so the material used in the sputtering process is called the "sputtering target". From metal titanium to titanium sputtering target Titanium sputtering target......
Baoji Lihua Nonferrous Metals Co., Ltd.
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Photoelectron Semiconductor Molybdenum Sputtering Target
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1. Grade: MO1.MO2 2. Purity :> =99.95% 3. Characteristic: Melting Point: 2610°C Boiling Point:5560°C Density: 10.2g/cm3 High quality, workability 4. Certificate: ISO9001:2008 5. Product Feature: High melting point, High-density, high temperature oxidation ......
Luoyang Forged Tungsten-Molybdenum Material Co., Ltd.
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316L Stainless Steel Round Pipe 50.8mm OD 5mm Wall ASTM A312 Annealed Pickled 6m
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...round pipe manufactured to ASTM A312 / A269, with outer diameter 50.8 mm and wall thickness 5 mm. The 316L grade contains molybdenum for excellent resistance to chlorides, seawater and aggressive chemicals, delivering long service life in demanding corrosive environments. The molybdenum-bearing 316L chemistry gives outstanding pitting and crevice corrosion resistance, making this round......
Shanxi Zhongcheng Metal Co., Ltd.
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Metal Sputtering Target Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum PVD Coating Evaporation
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...Sputtering Target Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum PVD Coating evaporation Metal sputtering targets are used in physical vapor deposition (PVD) processes to coat materials with a thin layer of metal. Common metals used for sputtering targets include titanium, aluminum, chrome, zirconium, nickel, niobium, tantalum, and molybdenum......
Baoji City Changsheng Titanium Co.,Ltd
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Non Magnetic Molybdenum Copper Alloy Magnetron Sputtering Target Molybdenum Alloy Target
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Molybdenum Copper Alloy Magnetron Sputtering Target 1. Description of Molybdenum Copper Alloy Magnetron Sputtering Target: The preparation of molybdenum-copper alloy magnetron sputtering targets is mainly by infiltration method. First, molybdenum powder with coarse particle size is used to sinter into a molybdenum billet skeleton, and then infiltrated in copper liquid to obtain molybdenum......
Shaanxi Peakrise Metal Co.,Ltd
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