High Purity Cr Chromium Sputtering Target Plate Shape For PVD Coating Machine
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...Sputtering targets are materials used to grow thin films by the sputtering process. These targets are fabricated from high-purity metals or ceramics through advanced melting, sintering, synthesis, and precision machining techniques. We provide sputtering targets in a wide range of materials, purities......
Baoji City Changsheng Titanium Co.,Ltd
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99.5% High Purity Zirconium Sputtering Target For Pvd Coating System
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... Target, Zirconium Target are available in varying sizes Grades: R60702, 99.2%min Purity: 99.5% Purity: 99.95% Hf<300ppm or Hf<4.5%) Shape: Round Shape , Tube Shape and Plate Shape. Sizes: Plate sputtering targets: Thickness: 0.04 to 1.40" (1.0 to...
JINXING MATECH CO LTD
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High Purity Titanium Sputtering Targets Meeting Stringent Standards In Medical Devices
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High Purity PVD Titanium Sputtering Targets Customized for Medication In the realm of advanced medical technology, the use of high purity titanium sputtering targets has gained significant attention. These targets, essential for Physical Vapor Deposition (PVD) processes, are vital for creating thin films that are used in various medical applications. With purity levels ranging from 99.5% to 99.995%, high purity titanium sputtering targets......
Baoji Lihua Nonferrous Metals Co., Ltd.
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3N5 127*458*10mm Chromium Sputtering Target Plate Shape
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...port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port Chromium (Chromium), chemical symbol Cr, atomic number 24, in the periodic table belongs to group ⅵ B. The element name comes from the Greek word for "color," because chromium compounds are...
Baoji Feiteng Metal Materials Co., Ltd.
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High-Purity Praseodymium Sputtering Target for Solar Cell Films & Photovoltaic Energy Applications
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...sputtering target is a high-purity functional material widely used in solar cells, semiconductor coatings, optical coatings, and magnetic materials. The product is made from high-purity praseodymium metal through precision processing, featuring excellent film uniformity, density, and sputtering stability. It is suitable for various coating processes, such as magnetron sputtering and ion beam sputtering......
Shanghai Sheeny Metal Mateirals Co.,Ltd.
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High Purity Graphite Sputtering Target Hot Pressing Sintering Process
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Engineered from high-purity graphite, the graphite targets exhibit exceptional thermal stability, superior heat resistance, and a low coefficient of thermal expansion. These targets are critical for depositing high-performance carbon films in sectors suc......
Shenzhen APG Material Company Limited
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High Purity Zirconium Sputtering Target Zirconium Tube For Energy-Saving Glass
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Product Information: Name: High Purity Zirconium Sputtering Target Zirconium Tube For Energy-Saving Glass Grade: Zr2 Zr4 Zr702 Zr705 Zr60804 Zr60001 Zr60901 Density: 6.51g/cm3 Size: OD 6-127mm,WT 0.5-4.5mm,L <10meters Or process according to customer's ......
Shaanxi Peakrise Metal Co.,Ltd
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High Purity Molybdenum Tube Target For Thin Film Solar Cells New Energy
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High Purity Molybdenum Tube Target used for thin film solar cells new energy Sputtering is a new type of Physical Vapor Deposition (PVD) method. Sputtering is widely used in: flat panel displays, glass industry (include architectural glass, automotive glass, optical film glass), solar cells, surface engineering, recording media, microelectronics, automotive lights and decorative coating, etc.. The sputtering......
Zhengzhou Sanhui Refractory Metal Co., Ltd.
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High Purity Planar Molybdenum Sputtering Target Plate Silver Color
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High Purity Molybdenum Planar Sputtering Targets Molybdenum Sputtering Target Description In the electronics industry molybdenum sputtering targets are mainly used for flat panel displays, electrodes and wiring materials for thin film solar cells and barrier layer materials for semiconductors. These are based on molybdenum's high melting point, high......
Luoyang Hypersolid Metal Tech Co., Ltd
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99.95% High Purity Molybdenum Targets For Sputtering Coating
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high purity molybdenum sputtering targets bond with back plate for sputtering coating molybdenum target from Sifon: 1. high purity ≥99.95% 2. high density ≥10.1g/cm3 3. wide dimension as T*3340*3340 4. wide application, our targets are widely accepted by customers. 5. we offer the service that if you finished useing the target, send them back to us, and we will pay. Molybdenum targets......
Fonlink Photoelectric (Luoyang) Co., ltd
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