Fine Grain Size Tungsten Sputtering Target With Hip / Cip / Forge Process
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Tungsten Sputtering Target Tungsten target, WTi sputtering target , The tungsten sputtering target is an important substrate for the tungsten oxide film to realize its functional transition in the semiconductor device. Due to the high melting point of tungsten, tungsten targets are mainly prepared by powder metallurgy Description The tungsten sputtering target is an important substrate for the tungsten......
JINXING MATECH CO LTD
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Tungsten Sputtering Targets (W) for PVD Coating
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...-tech fields due to its unique physical and chemical properties. Outstanding Properties of Tungsten Sputtering Targets l High Purity Made from high-purity elemental metal target material, with a purity of 99.9%-99.99%, suitable for evaporation, coating,...
Shenzhen APG Material Company Limited
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Round Tungsten Sputtering Target For Magnetron Sputtering Coating Tungsten Disc Tungsten Target Tungsten Round Stock
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Tungsten Sputtering Target For Magnetron Sputtering Coating 1. Description Of Tungsten Sputtering Target For Magnetron Sputtering Coating: The tungsten layer is part of the thin-film transistors of TFT-LCD screens. They are used when large-screen formats, extremely high image clarity, and optimized contrast ratios are required. Tungsten targets......
Shaanxi Peakrise Metal Co.,Ltd
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99.95% Pure Tungsten Sputtering Target Metal W Tungsten Target Anti Corrosion
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...fields because of its excellent physical and chemical properties. Sputtering targets are used for magnetron sputtering coating, which is a new type of physical vapor coating (PVD) method. An orthogonal magnetic field and an electric field are added between...
Zhenan Metallurgy Co., Ltd
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W Tungsten Target Rare Earth Smelting Titanium Tungsten Sputtering Target
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W Tungsten Sputtering Targets Aerospace, Rare Earth Smelting Tungsten Sputtering Targets widely used in Aerospace, rare earth smelting, electric light source, chemical equipment, medical equipment, metallurgical machinery, smelting equipment, petroleum......
Luoyang Hypersolid Metal Tech Co., Ltd
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Tantalum Tungsten Alloy Square Tungsten Sputtering Target Hot Isostatic Pressing
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...plane target, multi-arc target, step target, special-shaped target Applicable equipment: magnetron sputtering equipment, ion sputtering instrument, etc Freight shipping According to the consumer’s demands. size customized pay attention heavy quantity is...
Luoyang Forged Tungsten-Molybdenum Material Co., Ltd.
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High Purity Titanium Sputtering Target ASTM B348
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...99.5% minimum and impurity content below 0.04%. Targets are forged and CNC machined to ASTM B348 and ASTM B381 with a density of 4.51 or 4.50 g/cm3, and alloy targets such as Ti-Al, Ti-Cr and Ti-Zr as well as chrome, zirconium, copper and tungsten can also...
Baoji Lihua Nonferrous Metals Co., Ltd.
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Yttrium Sputtering Target for High-Temperature Stability & Superior Wear-Resistant Coating Films
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... decorative fields. The product is made from high-purity yttrium metal through advanced melting, forging, and precision machining processes. It features excellent sputtering stability, film layer uniformity, and structural density, making it suitable for...
Shanghai Sheeny Metal Mateirals Co.,Ltd.
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Ti Ti-Al Zr Cr Fe Cu PVD Coating Sputtering Targets 100*40mm 95*45mm 98*10mm
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...Sputtering targets are source materials used to deposit thin films through the sputtering process. These targets are manufactured by processing metals or ceramics through techniques such as melting, sintering, and precision machining. We provide sputtering targets made from a wide range of materials, purities, and shapes. By combining advanced technologies in material synthesis and mechanical processing, we can produce targets...
Baoji City Changsheng Titanium Co.,Ltd
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10.2g/Cm3 Pure Molybdenum Rectangular/Round Plate Sputtering Target For Coating
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...Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling The molybdenum sputtering target has the characteristics of high purity, high density and fine grain, so that the sputtering efficiency, uniform film thickness and smooth etching surface are obtained in sputtering. There are two kinds of molybdenum sputtering...
Zhengzhou Sanhui Refractory Metal Co., Ltd.
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