Zirconium Sputtering Target For PVD Coating Systerm Decorative Coating
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Zirconium Sputtering Target Zirconium sputtering target for PVD coating systerm, coating target, multi-arc target, sputtering target, vacuum coating target. Description Zirconium Sputtering Target, Zirconium Target are available in varying sizes Grades: R60702, 99.2%min Purity: 99.5% Purity: 99.95% Hf<300ppm or Hf<4.5%) Shape: Round Shape , Tube Shape and Plate Shape. Sizes: Plate sputtering targets......
JINXING MATECH CO LTD
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High Purity Zirconium Sputtering Target Zirconium Tube For Energy-Saving Glass
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...WT 0.5-4.5mm,L <10meters Or process according to customer's request. Standard: ASTM B523 ASTM B658,ASTM B353 Main process: Preparation of consumable electrodes, casting, forging, hot extrusion (tube blank), cold working and finishing. ......
Shaanxi Peakrise Metal Co.,Ltd
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High Purity Zr Zirconium Sputtering Target Material Corrosion Resistance
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Zirconium targets are sputtering targets processed from high-purity zirconium (Zr) metal. They feature low hydrogen absorption, a high melting point (1855℃), excellent corrosion resistance, and good thermal conductivity. They are widely used in semiconductors, optical coatings, and functional coatings. Due to zirconium......
Shenzhen APG Material Company Limited
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Pure Zirconium Sputtering Target Low Density Good Thermal Properties
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...zirconium sputtering target coating materials customization Zirconium Description Zirconium and zirconium alloys have low density, high specific strength, corrosion resistance, radiation resistance, excellent wear resistance, excellent processing performance, non-toxic,non-magnetic, compared with traditional stainless steel, copper, nickel, titanium and other metal alloys, zirconium and zirconium......
Luoyang Forged Tungsten-Molybdenum Material Co., Ltd.
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Metal Sputtering Target Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum PVD Coating Evaporation
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...Sputtering Target Titanium Aluminum Chrome Zirconium Nickel Niobium Tantalum Molybdenum PVD Coating evaporation Metal sputtering targets are used in physical vapor deposition (PVD) processes to coat materials with a thin layer of metal. Common metals used for sputtering targets include titanium, aluminum, chrome, zirconium......
Baoji City Changsheng Titanium Co.,Ltd
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High Purity Titanium Sputtering Targets For PVD Vacuum Coating Machine
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...Sputtering Targets for PVD Vacuum Coating Machine High purity titanium sputtering targets Product name Titanium Sputtering Targets for pvd coating machine Grade Titanium (Gr1, Gr2, Gr5, Gr7,GR12) Alloy target: Ti-Al, Ti-Cr, Ti-Zr etc Other materials:chrome,zirconium,copper ,tungsten etc. Origin Baoji city, Shaanxi Province,hina Titanium content ≥99.5 (%) Impurity content <0.04(%) Density 4.51 or 4.50 g/cm3 Standard ASTM...
Baoji Lihua Nonferrous Metals Co., Ltd.
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Molybdenum Planar Sputtering Targets
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... Sputtering Target Molybdenum Sputtering Target 10.2g/Cm3 Molybdenum Plate 10.2g/Cm3 Send Email Inquiry Now Molybdenum Sputtering Target Description In the electronics industry molybdenum sputtering targets are mainly used for flat panel displays,...
Luoyang Hypersolid Metal Tech Co., Ltd
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ASTM B861 Titanium Gr2 Tube Sputtering Target 2940mm Length
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...Target ASTM B861-06 a 133OD*125ID*2940L Include Flange Titanium Gr2 Name Titanium tube target Standard ASTM B861 Transport Package Vacuum package in wooden case Origin Baoji, Shaanxi, China Port of deliver Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port Size φ133*φ125*2940(include flange ) Tube target is a sputtering source which can form various functional films on the substrate by magnetron sputtering......
Baoji Feiteng Metal Materials Co., Ltd.
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10.2g/Cm3 Pure Molybdenum Rectangular/Round Plate Sputtering Target For Coating
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...Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling The molybdenum sputtering target has the characteristics of high purity, high density and fine grain, so that the sputtering efficiency, uniform film thickness and smooth etching surface are obtained in sputtering. There are two kinds of molybdenum sputtering...
Zhengzhou Sanhui Refractory Metal Co., Ltd.
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Natural Compound Fused Silica Sputtering Target High Temperature Resistant
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High temperature resistant high quality fused silica sputtering target Silicon dioxide sputtering target contains Si and O. Silicon dioxide (SiO2), also known as Silica, is a natural compound made from two of the most abundant materials on the planet: ......
Yantai ZK Optics Co., Ltd.
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