High Purity Alloy Tungsten Sputtering Target For Thin Film Industry
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...temperatures above 1650℃, 3000 ℉) and the highest tensile strength. Tungsten Sputtering Targets Information Tungsten Sputtering Targets Purity: 99.95%; Circular: Diameter ≤ 14 inch, Thickness ≥ 0.040'' Block: Length ≤ 32 inch, Width ≤ 12 inch,...
JINXING MATECH CO LTD
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W Tungsten Target Rare Earth Smelting Titanium Tungsten Sputtering Target
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...(mm) Custom Made 140-300 120-280 100-3300 Model Number W1 Shape customized Chemical Composition 99.95% W Feature (1) Smooth surface without pore,sporesch and o...
Luoyang Hypersolid Metal Tech Co., Ltd
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99.95% Pure Tungsten Sputtering Target Metal W Tungsten Target Anti Corrosion
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...fields because of its excellent physical and chemical properties. Sputtering targets are used for magnetron sputtering coating, which is a new type of physical vapor coating (PVD) method. An orthogonal magnetic field and an electric field are added between...
Zhenan Metallurgy Co., Ltd
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Round Tungsten Sputtering Target For Magnetron Sputtering Coating Tungsten Disc Tungsten Target Tungsten Round Stock
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Tungsten Sputtering Target For Magnetron Sputtering Coating 1. Description Of Tungsten Sputtering Target For Magnetron Sputtering Coating: The tungsten layer is part of the thin-film transistors of TFT-LCD screens. They are used when large-screen formats, extremely high image clarity, and optimized contrast ratios are required. Tungsten targets......
Shaanxi Peakrise Metal Co.,Ltd
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High Purity Tungsten Metal Alloy Tungsten Sputtering Target GB/T19001 Approved
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...tungsten target product for sales high temperature resistance Product Description High quality tungsten target product for sales Properties Target weight:≤200kg/pc, Purity:≥99.95%. Sputtering is a new type of Physical Vapor Deposition (PVD) method. Sputtering......
Luoyang Forged Tungsten-Molybdenum Material Co., Ltd.
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Tungsten Carbon Sputtering Target (WC Sputtering Target)
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Tungsten Carbon Sputtering Target is a type of functional target material composed of high-melting-point, high-hardness tungsten combined with excellent wear-resistant carbon in a certain proportion. It features a very high density and uniformity. It is primarily used in magnetron sputtering, ion plating, and other vacuum coating processes to produce thin films of excellent properties. Core Advantages of Tungsten Carbon Sputtering Target......
Shenzhen APG Material Company Limited
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3N5 99.95% Molybdenum Sputtering Target For Vacuum Coating
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... There are two kinds of molybdenum sputtering targets:molybdenum planar target and molybdenum rotary target. Molybdenum sputtering target is one kind of industrial material, which is widely used in conductive glass, STN / TN / TFT-LCD, optical glass,...
Zhengzhou Sanhui Refractory Metal Co., Ltd.
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High Purity Titanium Sputtering Target ASTM B348
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...99.5% minimum and impurity content below 0.04%. Targets are forged and CNC machined to ASTM B348 and ASTM B381 with a density of 4.51 or 4.50 g/cm3, and alloy targets such as Ti-Al, Ti-Cr and Ti-Zr as well as chrome, zirconium, copper and tungsten can also...
Baoji Lihua Nonferrous Metals Co., Ltd.
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99.995% Purity Titanium Sputtering Target PVD Coating Rotary Tube Targets
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99.995% Purity Titanium Sputtering Target PVD Coating Rotary Tube Targets Titanium target is one of the commonly used targets for preparing thin film materials, and has been widely used in magnetron sputtering technology. Such as integrated circuits, decorative coating industry, flat display and so on are needed. Therefore, the quality of titanium target is very important, and good titanium target......
Baoji City Changsheng Titanium Co.,Ltd
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Tungsten Molybdenum Target For Vacuum Sintering Furnace
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... industry, rare earth industry, chemical equipment area, medical equipment area, melting equipment, oil industry etc. Tungsten targets are our advantaged products. They are covering the target to protect the surface of the target. We can also bonding the...
Fonlink Photoelectric (Luoyang) Co., ltd
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