10.2g/Cm3 Pure Molybdenum Rectangular/Round Plate Sputtering Target For Coating
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...cm3 Pure Molybdenum Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling The molybdenum sputtering target has the characteristics of high purity, high density and fine grain, so that the sputtering efficiency, uniform film thickness and smooth etching surface are obtained in sputtering. There are two kinds of molybdenum sputtering...
Zhengzhou Sanhui Refractory Metal Co., Ltd.
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6.52 G/Cm3 Zirconium Sputter Target , Cylindrical Targets
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...Sputtering Targets, High Quality Cylindrical Targets Zirconium Sputtering Targets Description Zirconium Sputtering Targets (Zr) is a silver metal with a density of 6.52 g/cm3. Zirconium has a very small neutron adsorption cross section and relatively high melting point (1855°C or 3371°F), making it an excellent material for nuclear power rods. Zirconium sputtering targets......
JINXING MATECH CO LTD
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Gr5 Gr7 Titanium Silver Sputtering Target for High Purity Sputtering in Medical Applications Density 4.5 g/cm3
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Gr5 Gr7 Ti Silver Sputtering Target Titanium Sputtering Titanium Sputtering Target to High Purity Sputtering in Medical Applications In the rapidly advancing field of medical technology, the demand for high-quality materials is paramount. Among these ......
Baoji Lihua Nonferrous Metals Co., Ltd.
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Molybdenum Planar Sputtering Targets
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... Sputtering Target Molybdenum Sputtering Target 10.2g/Cm3 Molybdenum Plate 10.2g/Cm3 Send Email Inquiry Now Molybdenum Sputtering Target Description In the electronics industry molybdenum sputtering targets are mainly used for flat panel displays,...
Luoyang Hypersolid Metal Tech Co., Ltd
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Frosting Silicon Dioxide Sputtering Target 1100Mpa High Corrosion Resistance
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...Sputtering Target By Chinese Manufacturers Factory Chemical formula:SiO2 Molar mass:60.08 g/mol Density:2.648 (α-quartz), 2.196 (amorphous) g·cm−3 Melting point:1,713 °C (3,115 °F; 1,986 K) Boiling point:2,950 °C (5,340 °F; 3,220 K) Magnetic susceptibility (χ):−29.6·10−6 cm3......
Yantai ZK Optics Co., Ltd.
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TZM Molybdenum Disc SGS Molybdenum Sputtering Target For Medical Chemical Industrial
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...Sputtering Target plate sheets Product Description - uniform grain with densified microstructure ensures longer use time. - High special strenghth, high melt point - excellent corrosive resistance, good thermal resistance. - professional after-sales service Commodity Name Pure molybdenum sputtering target Density 10.2g/cm3......
HENAN HUAMAO METAl MATERIALS CO ,LTD
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8.6g/Cm3 Niobium Alloys Niobium Sputtering Target For Semiconductor
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niobium target purity 99.95% merchandise on hand customization Niobium Target Introduction With the characteristics of corrosion resistance, high temperature resistance and malleability, niobium target is widely used in coating industry, electronics ......
Luoyang Forged Tungsten-Molybdenum Material Co., Ltd.
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PVD Coating Tantalum Sputtering Target For Semiconductor Coating And Optical Coating
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Product Information: Name PVD coating tantalum target Grade Ta1 Ta2 RO5200 RO5400 RO5252 RO5255 Purity ≥99.95% Density 16.68g/cm3 Surface Machined surface, no pits, scratches, stains, burrs and other defects Standard ASTM B708 Shape Flat target, Rotating ......
Shaanxi Peakrise Metal Co.,Ltd
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ODM 10.15g/Cm3 Density Molybdenum Targets For PVD
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...wide application, our targets are widely accepted by customers. 5. we offer the service that if you finished useing the target, send them back to us, and we will pay. Molybdenum targets are our best advantaged products. We can make as big dimension as T...
Fonlink Photoelectric (Luoyang) Co., ltd
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Metal Nickel target,Nickel Oxide Target
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...) Evaporation Material Purity--- 99.5%, 99.9% Refractive Index---2-2.1 Transparence Wave Band----0.52um Shape---Ø10 Density---7.45g/cm3 Melting Point --...
Hebei Niuke Technology Co., Ltd
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