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| Categories | Sinter HIP Furnace |
|---|---|
| Brand Name: | EasyFashion |
| Model Number: | GN5518F-1 |
| Certification: | ISO9001:2008 |
| Place of Origin: | China |
| MOQ: | 1 set |
| Price: | To be discussed |
| Payment Terms: | T/T, Western Union |
| Supply Ability: | 15~25 sets per year |
| Delivery Time: | 90~160 days |
| Packaging Details: | standard packing, wooden cases |
| Operating life: | 6000 Furnace run (about 20 years) |
| Dimension of usable space: | 500×500×1800mm |
| Max. pressure: | 1MPa |
| Max. working pressure: | 0.98MPa |
| Max. load weight: | 500KG |
| Max. working temperature: | 1550°C |
Fast Cooling Sintering HIP Furnace With Hight Efficient Tungsten
Functions of pressure de-waxing, vacuum de-waxing, vacuum
sintering, partial pressure sintering, pressure sintering,
atmosphere sintering, fast cooling and etc.
Only 30 minutes is needed to cool down the furnace from 1450°C to
150°C
Stable performance
High density of product
Rapid cooling
Automatic control during whole process
Technical specifications
Model | GN3312F-1 | GN5518F-1 | ||
Operating life | 6000 Furnace run (about 20 years) | |||
Dimension of usable space | 300×300×1200mm | 500×500×1800mm | ||
Max. load weight | 500KG | 1500KG | ||
Power | 320kW | 420 kW | ||
Max. pressure | 1MPa | |||
Max. working pressure | 0.98MPa | |||
Max. working temperature | 1550°C | |||
Temperature control method | 3 zones | |||
High temperature uniformity | ≤±7°C | |||
Paraffin as the binder | Hc deviation | ≤±0.3KA/M | ||
Com deviation | ≤±0.2% | |||
Temperature increasing rate (without loading) | 10°C/min(≤1200°C); | |||
Ultimate vacuum | ≤ 2Pa, tested in cold and clean chamber | |||
Vacuum leak rate | ≤ 2Pa/h, tested in cold and clean chamber | |||
Pumping speed | ≤20 min., pumping to 3Pa in cold and clean chamber | |||
Wax collecting rate | ≥98﹪ | |||
Fast cooling(with loading) | From 1450 °C to 100°C, 30 minutes | From 1450 °C to 100°C, 40 minutes | ||
Temperature measuring | W-Re 5-26 double-core thermocouple | |||
Allowed process gases | Ar, H2, N2, CH4 | |||
Remarks:
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